Shaanxi BLOOM Tech Co., Ltd. yog ib qho ntawm cov tuam txhab kev paub ntau tshaj plaws thiab cov chaw muag khoom ntawm hafnium oxide hmoov cas 12055-23-1 hauv Suav teb. Txais tos rau cov lag luam wholesale bulk zoo siab hafnium oxide hmoov cas 12055-23-1 muag ntawm no los ntawm peb lub hoobkas. Kev pabcuam zoo thiab tus nqi tsim nyog muaj.
Hafnium oxide hmoov, tshuaj formula HfO2. Molecular hnyav 210.49. Dawb cubic siv lead ua. Lub ntiajteb txawj nqus 9.68. Melting point 2758 ± 25 degree. Lub boiling point yog hais txog 5400 degree. Hafnium dioxide ntawm monoclinic system yog hloov mus rau hauv tetragonal system nyob rau hauv txaus oxygen cua ntawm 1475 ~ 1600 degree. Insoluble hauv dej thiab General inorganic acids, tab sis maj mam soluble hauv hydrofluoric acid. Nws reacts nrog kub concentrated sulfuric acid los yog acid sulfate los tsim hafnium sulfate [hf (SO4) 2]. Tom qab sib tov nrog carbon, nws yog rhuab thiab chlorinated los tsim hafnium tetrachloride (hfcl4), reacts nrog poov tshuaj fluorosilicate rau tsim poov tshuaj fluorohafnium (k2hff6), thiab reacts nrog carbon los tsim hafnium carbide HFC saum toj no 1500 degree. Nws yog npaj los ntawm kev kub siab ncaj qha - kub kub ntawm hafnium carbide, tetrachloride, sulfide, boride, nitride los yog hydrated oxide.
|
Tshuaj Formula |
HfO2 |
|
Exact Mass |
212 |
|
Molecular Luj |
210 |
|
m/z |
212 (100.0%), 210 (77.8%), 209 (53.0%), 211 (38.8%), 208 (15.0%) |
|
Elemental Analysis |
Hf, 84,80; Nws, 15.20 |
Ib txoj kev npaj ntawm siab -purity qis zirconiumhafnium oxide hmoov, cov txheej txheem cov kauj ruam yog raws li nram no:
(1) Npaj cov tshuaj hafnium sulfate uas tsim nyog: noj hafnium oxide ua raw khoom, thiab tom qab ntawd yaj nws los ntawm alkali melting, hydrochloric acid dissolution, crystallization, impurity tshem tawm, nag lossis daus, pom, ziab, thiab tom qab ntawd yaj los ntawm sulfuric acid tov. Kho cov h + concentration, HfO2 concentration, thiab hafnium sulfate tov hauv hafnium sulfate tov;
(2) Cov extractant yog ua los ntawm qib qib N235 compounded nrog qib industrial a1416 thiab qib qib sulfonated kerosene. Lub ntim feem ntawm txhua feem ntawm cov extractant yog raws li nram no: n235:20%, a1416:7%, sulfonated kerosene: 73%. Cov extractant saum toj no yog siv rau peb-theem rho tawm los cais zirconium thiab hafnium los ntawm hafnium sulfate pub kua kom tau txais cov zirconium hafnium sulfate qis qis.
(3) Tom qab peb-theem rho tawm, cov seem ntawm qis zirconium hafnium sulfate extraction yog ua tiav los ntawm ammonia, yaug, qhuav, leached los ntawm hydrochloric acid, crystallized thiab purified, precipitated los ntawm ammonia, rinsed, qhuav thiab calcined kom tau cov khoom siab tshaj {{2}zirnium.
Hafnium oxide hmoov, raws li cov khoom siv oxide yooj yooj yim nrog qhov dav bandgap, siab dielectric tas li, thiab cov yam ntxwv ntawm ferroelectricity, muaj cov ntawv thov dav dav hauv kev lag luam microelectronics. Raws li qhov siab -k dielectric txheej cov khoom, nws tuaj yeem txhim kho kev ua haujlwm ntawm transistors, txo cov cuab yeej loj, thiab txo qis zog noj; Raws li ferroelectric nco cov ntaub ntawv, nws coj lub cib fim tshiab rau txoj kev loj hlob ntawm cov tiam tom ntej uas tsis yog - nco volatile. Txawm li cas los xij, cov ntawv thov hauv thaj chaw ntawm microelectronics tseem ntsib qee qhov kev sib tw, xws li kev hloov pauv theem, teeb meem cuam tshuam, cov txheej txheem doping, thiab cov txheej txheem npaj. Los ntawm kev nruam kev thev naus laus zis thiab kev tshawb fawb, cov kev cov nyom no xav kom daws tau.
Daim ntawv thov keeb kwm yav dhau los ntawm microelectronics
Kev txwv ntawm cov tsoos silicon dioxide rooj vag rwb thaiv tsev txheej
Hauv cov khoom siv microelectronic tsoos, silicon dioxide tau siv los ua lub rooj vag insulating txheej khoom. Txawm li cas los xij, nrog kev txhim kho txuas ntxiv ntawm cov tshuab hluav taws xob semiconductor, qhov loj ntawm cov transistors yog tas li shrinking, thiab lub thickness ntawm silicon dioxide rooj vag rwb thaiv tsev txheej yog maj mam nce nws lub cev txwv. Thaum lub thickness ntawm silicon dioxide lub rooj vag dielectric txo mus rau ib qho twg, lub qhov rooj to qhov teeb meem yuav ho nce, uas ua rau ib tug txo nyob rau hauv transistor kev ua tau zoo thiab nce nyob rau hauv lub hwj chim noj.
Qhov zoo raws li cov khoom siv ntxiv
Qhov tshwm sim ntawmhafnium oxide hmoovmuab txoj hauv kev zoo los daws cov teeb meem saum toj no. Piv rau silicon dioxide, hafnium dioxide muaj ntau dua dielectric tas li thiab muaj peev xwm muab tib lub peev xwm ntawm cov tuab tuab, txo qhov loj ntawm transistors. Lub caij no, hafnium dioxide muaj kev sib raug zoo nrog cov txheej txheem sib xyaw ua ke thiab tuaj yeem yooj yim ua ke rau hauv cov txheej txheem tsim khoom microelectronic uas twb muaj lawm. Tsis tas li ntawd, cov khoom ferroelectric ntawm hafnium dioxide muab qhov muaj peev xwm tshiab rau nws daim ntawv thov hauv tsis yog - lub cim xeeb tsis zoo thiab lwm qhov chaw.
Kev siv tshwj xeeb ntawm hafnium dioxide hauv microelectronics
High k dielectric txheej khoom
(1) Txhim kho kev ua haujlwm ntawm transistor
Hafnium dioxide yog siv dav hauv cov khoom siv semiconductor los tsim cov txheej txheem siab -k dielectric, hloov cov tsoos SiO ₂ rooj vag txheej txheej. Lub siab -k dielectric txheej tuaj yeem txo cov qhov rooj nkag, txhim kho kev tsav tsheb tam sim no thiab hloov ceev ntawm lub transistor, thiab txhim khu kev ua haujlwm ntawm transistor. Piv txwv li, thaum Intel qhia txog 65 nanometer manufacturing txheej txheem.
Txawm hais tias nws tau ua txhua yam los txo qhov tuab ntawm silicon dioxide rooj vag dielectric mus rau 1.2 nanometers, qhov nyuaj ntawm kev siv hluav taws xob thiab hluav taws xob tawg tau nce ntxiv thaum lub transistor txo qis rau atomic loj, uas ua rau cov pov tseg tam sim no thiab lub zog hluav taws xob tsis tsim nyog, thiab cov teeb meem xau tau nce ntxiv. Txhawm rau daws qhov teeb meem no, Intel tau siv cov khoom tuab dua siab dua -K cov ntaub ntawv (hafnium raws li cov ntaub ntawv) ua lub rooj vag dielectrics es tsis txhob siv cov silicon dioxide, ua tau zoo txo cov pa tawm ntau dua 10 zaug.
(2) Txo cov cuab yeej loj
Nrog rau kev nce qib txuas ntxiv ntawm cov txheej txheem siab heev, cov khoom siv microelectronic tau nce siab rau qhov loj. Lub siab dielectric tas li ntawm hafnium dioxide ua rau nws muab lub peev xwm txaus ntawm cov thicknesses thinner, yog li ua tau raws li qhov kev thov rau qhov loj me me me me. Piv nrog rau yav dhau los tiam ntawm 65 nanometer technology, 45 nanometer txheej txheem siv hafnium dioxide raws li lub rooj vag dielectric tsub kom transistor ceev los ntawm ze li ntawm 2 lub sij hawm, tso cai rau ib tug nce nyob rau hauv tag nrho cov transistors los yog txo nyob rau hauv processor loj.
(3) Txo kev siv hluav taws xob
Daim ntawv thov ntawm hafnium dioxide siab -k dielectric txheej kuj tuaj yeem txo qhov kev siv hluav taws xob ntawm microelectronic li zoo. Los ntawm kev txo lub rooj vag to thiab nce kev hloov ceev ntawm transistors, hafnium dioxide tuaj yeem txo lub zog poob thaum lub sijhawm ua haujlwm, txuas roj teeb lub neej, thiab txhim kho cov khoom siv hluav taws xob.
Ferroelectric nco cov ntaub ntawv
(1) Kev tshawb nrhiav thiab kev siv lub zeem muag ntawm ferroelectricity
Hauv xyoo 2011, pab pawg R & D ntawm NaMLab cov khoom siv hluav taws xob pib tsim los ntawm Qimonda Semiconductor Company thiab Dresden University of Technology hauv lub teb chaws Yelemees npaj HfO ₂ nyias zaj duab xis doped nrog silicon dioxide nrog lub thickness tsawg dua 10 nm los ntawm atomic txheej deposition technology, thiab soj ntsuam lub cim hysteresis cov ntaub ntawv nyob rau hauv thawj zaug ferroelectric cov ntaub ntawv. Qhov kev tshawb pom no tau tsim lub hauv paus rau kev siv cov hafnium dioxide hauv thaj chaw ntawm ferroelectric nco. Ferroelectric lub cim xeeb muaj qhov zoo ntawm qhov tsis yog- tsis hloov pauv, siab - nyeem ntawv thiab sau nrawm, thiab siv hluav taws xob tsawg, thiab suav tias yog ib qho tseem ceeb ntawm kev txhim kho kev nco rau tiam tom ntej.
(2) Lub hauv paus ntsiab lus ua haujlwm ntawm ferroelectric nco
Ferroelectric nco siv ferroelectricity ntawm ferroelectric cov ntaub ntawv khaws cia thiab nyeem cov ntaub ntawv. Ferroelectric cov ntaub ntawv muaj cov yam ntxwv ntawm polarization, thiab cov kev taw qhia polarization tuaj yeem thim rov qab raws li qhov kev txiav txim ntawm ib qho hluav taws xob sab nraud. Hauv ferroelectric nco, kev taw qhia polarization ntawm cov khoom siv ferroelectric hloov pauv los ntawm kev siv cov hluav taws xob sib txawv los sawv cev cov ntaub ntawv sib txawv (xws li "0" thiab "1"). Vim tias qhov ruaj khov polarization ntawm cov ntaub ntawv ferroelectric txawm tias tom qab tshem tawm cov hluav taws xob sab nraud, ferroelectric nco tsis muaj - cov khoom tsis hloov pauv.
(3) Qhov zoo ntawm hafnium dioxide ferroelectric nco
Piv nrog rau cov khoom siv ferroelectric ib txwm muaj, hafnium dioxide ferroelectric nco muaj qhov zoo hauv qab no:
Kev sib raug zoo nrog CMOS thev naus laus zis: Hafnium dioxide tuaj yeem yooj yim ua ke rau hauv cov txheej txheem CMOS uas twb muaj lawm, txo cov nqi tsim khoom thiab cov txheej txheem nyuaj.
Me me: Hafnium dioxide tuaj yeem ua tiav ferroelectricity ntawm thinner thicknesses, uas yog qhov zoo rau kev txo qhov loj ntawm lub cim xeeb thiab txhim kho kev sib koom ua ke.
Kev ua haujlwm ruaj khov: Hafnium dioxide muaj cov tshuaj zoo thiab thermal stability, uas tuaj yeem tswj kev ua haujlwm ruaj khov hauv qhov chaw hnyav thiab txhim kho kev cia siab ntawm kev nco.
(4) Kev tshawb nrhiav kev nce qib thiab kev thov
Nyob rau hauv xyoo tas los no, kev vam meej tseem ceeb tau ua tiav hauv kev tshawb fawb ntawm ferroelectricity ntawm hafnium dioxide. Muaj twb muaj cov tuam txhab txawv teb chaws uas tau tsim cov qauv qauv rau HfO2 - raws li ferroelectric nco.
Thiab ob peb lub tuam txhab tab tom tso tawm kev txhim kho ntawm peb - qhov sib xyaw ua ke logic circuits.
Hauv kev tshawb fawb txog kev tshawb fawb yooj yim, muaj kev nce ntxiv ntawm kev ua haujlwm ntawm ferroelectricity ntawm HfO2, thiab lub hauv paus chiv keeb, kev hloov ntawm cov txheej txheem, kev tsim khoom, thiab kev siv lub zog ntawm nws cov ferroelectricity yog cov lus qhia tseem ceeb ntawm kev tshawb fawb. Txawm li cas los xij, tam sim no hafnium dioxide ferroelectric nco tseem nyob rau hauv kev tshawb fawb thiab kev sim theem, thiab tseem muaj qee qhov kev ncua deb mus ua ntej loj - daim ntawv thov kev lag luam.
Lwm yam kev siv ntawm microelectronic li
(1) Dielectric ceramics
Nws tseem tuaj yeem siv los tsim cov khoom siv hluav taws xob dielectric, uas ua si rwb thaiv tsev, lim thiab lwm yam haujlwm hauv microelectronic li. Nws cov dielectric siab tas li thiab kev ua haujlwm zoo rwb thaiv tsev ua rau cov dielectric ceramics kom muaj kev ua tau zoo nyob rau hauv ib puag ncig hnyav xws li cov zaus thiab kub kub, txhim kho kev ntseeg tau thiab ruaj khov ntawm microelectronic li.
(2) Microcapacitors
Hauv microelectronic circuits, capacitor yog ib qho tseem ceeb ntawm cov khoom siv. Hafnium dioxide tuaj yeem siv los tsim cov micro capacitors, muab cov txiaj ntsig ruaj khov rau cov khoom siv hluav taws xob. Piv nrog rau cov khoom siv capacitor ib txwm muaj, hafnium dioxide micro capacitors muaj qhov zoo xws li lub ntim me me, qhov muaj peev xwm loj, thiab kev ua haujlwm ruaj khov, uas muaj txiaj ntsig zoo rau kev txhim kho kev sib koom ua ke thiab kev ua haujlwm ntawm circuits.
(3) Cov ntaub ntawv txheej
Nws muaj qhov hnav tsis kam thiab corrosion kuj, thiab tuaj yeem siv los ua cov khoom siv txheej rau kev tsim khoom siv microelectronic. Piv txwv li, txheej txheej ntawm hafnium dioxide nyob rau saum npoo ntawm semiconductor nti tuaj yeem tiv thaiv cov nti los ntawm kev yaig ib puag ncig sab nraud, txhim kho kev ntseeg tau thiab kev pabcuam lub neej ntawm cov nti.
Nyob rau hauv lub neej yav tom ntej, nrog kev xav tau ntau dua thiab cov khoom siv me me hauv kev lag luam semiconductor, nrog rau kev loj hlob sai ntawm lub zog tshiab, optoelectronic thev naus laus zis, thiab kev tiv thaiv ib puag ncig, daim ntawv thov hauv microelectronics yuav txuas ntxiv nthuav dav thiab tob zuj zus, ua qhov tseem ceeb hauv kev txhawb nqa kev txhim kho microelectronics technology.
Microelectronics thev naus laus zis, ua lub hauv paus ntawm cov ntaub ntawv xov xwm niaj hnub no, ua lub luag haujlwm tseem ceeb hauv kev txhawb nqa kev vam meej thiab kev lag luam. Kev xaiv cov khoom siv dielectric yog qhov tseem ceeb hauv kev tsim cov khoom siv microelectronic, vim nws cuam tshuam ncaj qha rau kev ua haujlwm, qhov loj me, thiab lub zog siv ntawm cov khoom siv. Hafnium dioxide (HfO ₂), raws li cov khoom siv oxide yooj yooj yim nrog kev sib kis dav thiab siab dielectric tas li, tau txais kev saib xyuas thoob plaws hauv microelectronics hauv xyoo tas los no. Nws cov khoom tshwj xeeb ntawm lub cev thiab tshuaj lom neeg ua rau nws muaj peev xwm sib tw cov khoom siv los hloov cov tsoos silicon dioxide (SiO2) rooj vag rwb thaiv tsev txheej, nqa cov hauv kev tshiab rau kev tsim cov khoom siv hluav taws xob microelectronic.
Cov khoom siv tshuaj
Hafnium dioxide yog insoluble hauv dej, hydrochloric acid, thiab nitric acid, tab sis soluble nyob rau hauv concentrated sulfuric acid thiab hydrofluoric acid. Qhov kev ruaj ntseg tshuaj no ua rau hafnium dioxide tiv thaiv corrosion los ntawm ntau yam tshuaj thaum lub sij hawm tsim cov txheej txheem ntawm microelectronic pab kiag li lawm, ua kom ntseeg tau thiab stability ntawm cov cuab yeej.
Cov khoom hluav taws xob
Hafnium dioxide muaj lub siab dielectric tas li, uas yog ib qho ntawm cov yam ntxwv tseem ceeb rau nws txoj kev siv dav hauv microelectronics. Lub siab dielectric tas li ua rau hafnium dioxide muab tib lub peev xwm zoo li silicon dioxide ntawm cov tuab tuab, txo qhov loj ntawm transistors thiab txhim kho kev sib koom ua ke ntawm cov khoom siv. Tsis tas li ntawd, hafnium dioxide nthuav tawm cov yam ntxwv tsis zoo ntawm ferroelectric, ua rau muaj kev cia siab rau kev thov ntawm - tiam tom ntej siab - ntom, tsis yog - tsis muaj zog ferroelectric nco.
FAQ
Dab tsi yog hafnium oxide siv rau?
Hafnium oxide (HfO2) txhais tau tias yog cov khoom siv uas muaj qhov siab dielectric tas li, qhov sib txawv ntawm qhov dav, thiab thermal stability zoo, ua rau nws tsim nyog rau kev siv hauv cov khoom siv semiconductor, electronics, thiab optical coatings.
Puas yog hafnium oxide lom?
Cov teebmeem ntawm Overexposure
Tej zaum yuav ua rau khaus, o tuaj yeem tshwm sim. Kev noj haus yuav ua rau qee qhov tsis xis nyob. Hafnium raug suav hais tias tsis yog - tshuaj lom vim qhov nqus tsis zoo ntawm nws nyob rau hauv lub plab zom mov ntawm cov tsiaj nyeg.
Cim npe nrov: Hafnium oxide hmoov CAS 12055-23-1, lwm tus neeg, manufacturers, hoobkas, lag luam wholesale, yuav, nqe, tej, kev muag khoom