(Trifluoromethyl) trimethylsilane,Lub npe Suav yog trifluoromethyltrimethylsilane, uas yog cov tshuaj lom neeg. Cov tsos mob yog cov pob tshab tsis muaj xim, soluble nyob rau hauv feem ntau cov organic solvents, rhiab rau acids, bases, thiab noo noo, thiab yuav tsum tau cia nyob rau hauv qhuav tej yam kev mob thiab siv nyob rau hauv ib tug fume hood. Nws tuaj yeem siv los ua ib qho tseem ceeb reagent rau trifluoromethylation ntawm electrophilic substrates thiab rau nucleophilic ntxiv cov tshuaj tiv thaiv ntawm aldehydes thiab ketones.
Nws reacts nrog catalytic F - (los yog CsF) los tsim trifluoromethyl thiab reacts nrog carbonyl tebchaw los tsim trifluoromethyl cawv. Yuav siv tau los ua biomaterials lossis organic compounds rau kev tshawb fawb txog kev ua neej. Raws li cov khoom siv hluav taws xob hluav taws xob (qeb 2), nws yog ib qho tsim nyog yuav tsum nyob deb ntawm qhov chaw tshav kub, qhov hluav taws xob, qhib nplaim taws, thiab qhov chaw kub thaum siv, txwv tsis pub haus luam yeeb, thiab khaws lub ntim ntim.

Cov ntaub ntawv ntxiv ntawm chemical compound:
|
Tshuaj Formula |
C4H9F3 Si |
|
Exact Mass |
142.04 |
|
Molecular Luj |
142.20 |
|
m/z |
142.04(100.0%),143.04(5.1%),143.05(4.3%),144.04(3.3%) |
|
Elemental Analysis |
C, 33,79; H, 6,38; F, 40,08; Ib., 19.75 |
|
Boiling point |
54-55℃(lit.) |
|
Qhov ntom |
0.962 g / mL ntawm 20℃(lit.) |
|
Cia tej yam kev mob |
2-8 degree |
|
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Chemical Structure
● Molecular Architecture
TMSCF₃ muaj cov qauv molecular C₄H₉F₃Si, nrog molar loj ntawm 142.20 g / mol. Nws cov qauv muaj lub hauv paus silicon atom txuas rau peb pawg methyl (–CH₃) thiab pawg trifluoromethyl (–CF₃). Cov pab pawg trifluoromethyl yog electron heev- rho tawm vim electronegativity ntawm fluorine, tsim ib tug muaj zog inductive nyhuv uas stabilizes tsis zoo nqi nyob ib sab thiab polarizes bonds nyob rau hauv nucleophilic ntxiv tshuaj. Pab pawg TMS, hloov pauv, ua raws li pab pawg tawm mus, txhawb kev hloov pauv ntawm -CF₃ moiety rau substrates.
● Lub cev thiab tshuaj muaj zog
Cov tsos mob: tsis muaj xim tsis muaj kua.
Qhov ceev: 0.926-0.962 g / cm³ (ntawm 20 degree).
Flammability: Kub heev (flash point: -17 degree).
Reactivity: Reacts hnyav nrog dej, tso cov pa taws (piv txwv li, silanes thiab HF), yuav tsum tau ua kom tsis muaj dej nyob hauv cov roj inert (piv txwv li, nitrogen lossis argon).
Stability: Volatile thiab noo noo-sensitive; decomposes thaum lub sij hawm raug rau huab cua los yog lub teeb.
Cov khoom no qhia txog qhov xav tau ntawm cov txheej txheem kev nyab xeeb nruj, suav nrog kev khaws cia hauv cov thawv ntim kom deb ntawm tshav kub thiab noo noo, thiab siv cov cuab yeej tiv thaiv tus kheej (PPE) thaum tuav.

(Trifluoromethyl) trimethylsilaneyog ib qho tseem ceeb organic synthesis reagent nrog ntau yam kev siv. Cov hauv qab no yog cov lus piav qhia ntxaws txog nws lub hom phiaj:
Trifluoromethyltrimethylsilane (TFMS) yog ib qho zoo trifluoromethylation reagent uas ua lub luag haujlwm tseem ceeb hauv cov organic synthesis. Nws tuaj yeem qhia txog trifluoromethyl rau hauv lub hom phiaj molecule los ntawm nucleophilic ntxiv cov tshuaj tiv thaiv nrog cov tebchaw xws li aldehydes thiab ketones. Cov tshuaj tiv thaiv kab mob no yog me me, yooj yim rau kev khiav lag luam, thiab cov khoom yog yooj yim cais thiab purify.


Hauv kev sib xyaw tshuaj, kev qhia txog trifluoromethyl tuaj yeem hloov pauv kev ua haujlwm lom neeg, metabolic stability, thiab cov tshuaj pharmacokinetic ntawm cov tshuaj. TFMS, raws li trifluoromethylation reagent, tuaj yeem yooj yim qhia trifluoromethyl los ua ke cov tshuaj molecules nrog cov dej num tshiab lom neeg. Piv txwv li, qee cov tshuaj tiv thaiv kab mob qog nqaij hlav, tshuaj tiv thaiv kab mob, thiab cov tshuaj tiv thaiv neuroprotective tuaj yeem txhim kho lawv cov txiaj ntsig thiab txo cov kev mob tshwm sim los ntawm kev qhia txog trifluoromethyl.
Hauv kev lag luam ntawm cov ntaub ntawv tshawb fawb, kev qhia txog trifluoromethyl tuaj yeem txhim kho cov khoom ntawm cov khoom, xws li kev ua kom sov, tiv thaiv corrosion, oxidation tsis kam, thiab lwm yam. TFMS, raws li trifluoromethylation reagent, tuaj yeem siv los ua cov khoom siv polymer nrog cov khoom tshwj xeeb, organic-inorganic composite khoom, thiab lwm yam.

Raws li raw khoom rau synthesizing lwm cov tebchaw

Synthesis ntawm potassium (trifluoromethyl) - trimethoxyborate: Potassium (trifluoromethyl) - trimethoxyborate yog ib qho tseem ceeb organic boron compound nrog dav daim ntawv thov nqi. Cov tshuaj no tuaj yeem ua ke los ntawm kev ua haujlwm TFMS nrog cov tshuaj potassium thiab trimethoxyboronic acid. Qhov kev sib xyaw no muaj peev xwm siv tau hauv cov tshuaj tiv thaiv catalytic, cov khoom siv hluavtaws, thiab lwm yam.
Synthesis ntawm trifluoromethyl tooj liab tebchaw: trifluoromethyl tooj liab tebchaw yog ib chav kawm ntawm cov tebchaw nrog tshwj xeeb cov qauv thiab cov khoom uas ua si lub luag hauj lwm tseem ceeb hauv organic synthesis thiab catalytic tshua. Los ntawm reacting TFMS nrog tooj liab tebchaw, trifluoromethyl tooj liab tebchaw nrog cov qauv sib txawv thiab kev ua haujlwm tuaj yeem ua ke. Cov tebchaw no muaj peev xwm siv dav hauv cov tshuaj tiv thaiv catalytic, tshuaj synthesis, thiab lwm yam.


Synthesis ntawm lwm yam fluorine- muaj cov tebchaw: Ntxiv nrog rau cov tebchaw saum toj no, TFMS kuj tuaj yeem siv los ua ke lwm cov fluorine- muaj cov tshuaj, xws li trifluoromethanesulfonamide nrog trifluoromethylthiolation, difluoromethyl trifluoromethanesulfonate, thiab lwm yam. chemistry.
(Trifluoromethyl) trimethylsilanekuj tseem tuaj yeem ua tus catalyst thiab txhawb nqa, txhawb kev nce qib ntawm cov tshuaj tiv thaiv, nce cov tshuaj tiv thaiv, thiab xaiv cov tshuaj tiv thaiv.
Catalyst: TFMS tuaj yeem ua tus catalyst rau qee yam tshuaj lom neeg, xws li esterification thiab alkylation cov tshuaj tiv thaiv. Los ntawm kev qhia txog trifluoromethyl, kev ua haujlwm thiab kev xaiv ntawm cov tshuaj reactants tuaj yeem hloov pauv, yog li txhim kho cov tshuaj tiv thaiv thiab cov khoom purity.


Additives: TFMS tuaj yeem siv los ua cov tshuaj ntxiv hauv qee cov tshuaj tiv thaiv, xws li cov kuab tshuaj, stabilizers, thiab lwm yam. Nws tuaj yeem tsim cov complexes ruaj khov lossis kev sib koom ua ke nrog lwm cov tebchaw, yog li txhim kho cov tshuaj tiv thaiv thiab txhim kho cov tshuaj tiv thaiv.
Siv rau kev npaj ion pauv resins: TFMS tuaj yeem siv nrog lwm cov tshuaj los npaj cov resins nrog cov khoom sib pauv ion tshwj xeeb los ntawm kev sib txuas - kev sib txuas. Cov resins no muaj kev siv dav dav hauv cov teb xws li kev kho dej thiab kev kho dej khib nyiab.
Siv rau kev npaj cov surfactants: TFMS tuaj yeem ua cov khoom siv ua ntej rau cov surfactants, sib txuas cov ntsiab lus nrog cov dej num tshwj xeeb los ntawm kev ua haujlwm nrog lwm cov tebchaw.


Cov tebchaw no muaj ntau yam kev siv nyiaj ntau hauv cov khoom siv tshuaj txhua hnub, cov tshuaj oilfield, thiab lwm yam.
Siv rau kev npaj cov pa roj purifiers: TFMS kuj tseem siv tau los npaj cov pa roj purifiers los ntawm kev ua pa nrog impurities hauv cov roj los hloov lawv mus rau hauv cov khoom tsis zoo lossis yooj yim tswj tau. Cov roj purifier no muaj peev xwm thov kev cia siab rau hauv kev tiv thaiv ib puag ncig.
Nyob rau hauv cov txheej txheem synthesis ntawm cov tub ntxhais fluorine- muaj cov kua qaub rhiab monomer nyob rau hauv 193nm ArF immersion photoresist, TMSCF3 yog tib reagent uas muaj peev xwm qhia tau tseeb trifluoromethyl tertiary cawv qauv ntawm kev lag luam. Qhia txog trifluoromethyl tertiary cawv pawg rau hauv cov qauv ntawm photoresist tuaj yeem txhim kho nws cov 193nm transmittance thiab txhim khu nws tsis kam mus rau qhuav etching. Qhov kev daws teeb meem ntawm photoresist tuaj yeem nce mus rau qis dua 7nm, ua tau raws li qhov xav tau ntawm lithography ntawm cov txheej txheem siab heev.

Cov txheej txheem sib xyaw ua ke ntawm hom fluorinated monomer no yuav tsum tau siv cov pa roj carbon dioxide trifluoromethyl bromide ntawm trifluoromethyltrimethylsilane, thiab cov tshuaj tiv thaiv yuav tsum tau nqa tawm ntawm ultra- qhov kub thiab txias ntawm -78 degree, uas yog tsis yooj yim sua kom ua tiav kev lag luam loj.
Txawm li cas los xij, cov txheej txheem siv TMSCF3 raws li trifluoromethylation reagent tuaj yeem ua tiav cov tshuaj tiv thaiv ntawm chav tsev kub thiab siab, thiab purity ntawm cov khoom tuaj yeem ncav cuag 99.99% ruaj khov, nrog rau tag nrho cov hlau impurity cov ntsiab lus tsawg dua 0.1ppm, ua tau raws li qhov yuav tsum tau ua ntawm semiconductor qib photoresist monomers. Tam sim no, cov tuam txhab photoresist sab saum toj hauv teb chaws tau ua tiav cov khoom lag luam loj ntawm fluorinated monomer, rhuav tshem lub sijhawm ntev - lub sijhawm monopoly ntawm cov tuam txhab txawv teb chaws hauv ArF photoresist teb.

Fluorinated functional Cheebtsam ntawm tom ntej - tiam EUV photoresist

Hauv kev txhim kho cov tiam tom ntej ultraviolet ultraviolet (EUV) photoresist, TMSCF3 yog siv los ua kom cov fluorine nqus tau zoo heev -muaj cov tshuab hluav taws xob photoacid. Qhia ntau pawg trifluoromethyl rau hauv cov qauv molecular ntawm lub tshuab hluav taws xob yees duab tuaj yeem txhim kho nws cov EUV photon absorption hla ntu thiab ua kom muaj zog ntawm cov kua qaub generated.
Qhov raug rhiab heev ntawm EUV photoresist tau nce los ntawm ntau tshaj ob zaug, tag nrho kev daws qhov ntev - sawv kev txwv ntawm kev sib kis ceev hauv EUV lithography tshuab tsim muaj peev xwm. Tam sim no, ntau lub tsev tshawb fawb hauv tsev thiab cov lag luam tab tom tsim EUV photoresist nrog kev ywj pheej ntawm cov tswv cuab kev txawj ntse raws li TMSCF3, thiab cov cuab yeej cuam tshuam tau nkag mus rau theem tsav.

Fluorinated Electronic Precursors rau Semiconductor Chip Manufacturing

TMSCF3 tuaj yeem txuas ntxiv fluorinated thiab tawg los ua ke cov khoom siv hluav taws xob zoo ib puag ncig fluorinated hluav taws xob tshwj xeeb rau etching ntawm - tiam semiconductor chips. Lub tsev cog khoom muaj peev xwm (GWP) ntawm cov roj etching tshiab no tsuas yog 1% ntawm cov tshuaj perfluorinated etching gases, thaum lub etching selectivity rau silicon-raws li xov xwm yog nce ntau tshaj peb zaug,
ua nws lub hauv paus hluav taws xob tshwj xeeb roj rau tiam tom ntej ntawm ntsuab semiconductor manufacturing. Tam sim no, cov thev naus laus zis no tau ua tiav kev tsim kho hauv cov tuam txhab hluav taws xob hauv tsev thiab cov chaw tsim hluav taws xob tshwj xeeb, thiab yuav siv rau hauv kev tsim khoom loj - yav tom ntej.

Trifluoromethyl carbonate additives rau siab -voltage electrolytes
Ib qho tshiab carbonate electrolyte hnyav uas muaj cov pab pawg trifluoromethyl tuaj yeem ua tau zoo los ntawm kev hloov pauv nucleophilic cov tshuaj tiv thaiv ntawm TMSCF3 thiab dimethyl carbonate. Lub flash point ntawm no tshiab fluorinated hnyav tshaj 130 degree, thiab lub qhov rais electrochemical stability mus txog 5.2V, tag nrho haum rau siab -voltage fais fab roj teeb systems saum 4.6V. At the same time, a dense and stable CEI film can be formed on the positive electrode surface, significantly inhibiting the oxidation and decomposition of the electrolyte under high voltage.
Hauv kev sim siab nickel ternary fais fab roj teeb, siv cov electrolyte uas muaj fluorinated carbonate ua cov kuab tshuaj tseem ceeb, lub voj voog lub neej ntawm lub roj teeb tau nce los ntawm 1200 npaug rau 2800 zaug, thiab qhov kev nthuav dav ntawm lub roj teeb ntawm qhov kub ntawm 60℃tau txo los ntawm 70%. Qhov kev ua tau zoo tshaj plaws tau dhau los ntawm cov txheej txheem carbonate electrolyte. Tam sim no, ntau lub tuam txhab electrolyte hauv Suav teb tau ua tiav qhov kev tsim cov tshuaj fluorine - muaj cov kuab tshuaj thiab pib siv cov khoom siv loj hauv cov tiam tshiab ntawm cov roj teeb ntev ntev -.

Core trifluoromethyl block ntawm lub cim tshiab ntawm fluorine- muaj tshuaj tua kab mob

Cov tshuaj fluorine- muaj cov tshuaj tua kab mob chiral uas tsim los ntawm TMSCF3 muaj cov tshuaj tua kab mob ntau dua 10 npaug ntawm cov tshuaj tua kab ib txwm muaj, nrog rau ntau npaum li ob peb grams toj ib thaj av, qis dua li cov tshuaj tua kab. Nyob rau tib lub sijhawm, cov tshuaj tua kab no tuaj yeem ua kom sai thiab ua tiav hauv ib puag ncig ntuj, yuav luag tsis tsim cov tshuaj tua kab, ua rau nws muaj ntau yam tseem ceeb rau kev txhawb nqa kev ua liaj ua teb ntsuab.
Lub fluorinated kab loj hlob regulator synthesized siv TMSCF3 muaj peev xwm cuam tshuam rau cov txheej txheem molting ntawm kab tsuag, thiab yog kiag li tsis muaj - lom rau tej yam tsiaj thiab tsiaj ntawm cov tsiaj, ua rau nws yog ib tug tiam tshiab ntawm ib puag ncig cov tshuaj tua kab. Qhov kev ua tau zoo ntawm cov tshuaj tua kab no ntau dua 95%, thiab nws tsis ua rau muaj kab tsuag. Nws tau siv dav hauv ntau lub hauv paus ntsuab organic ua liaj ua teb hauv Suav teb.

Cov lus nug nquag
Trifluoromethyl yog dab tsi?
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Cov pab pawg trifluoromethyl txhais tau tias yog -CF3 hloov pauv uas, thaum nkag mus rau hauv cov organic compound, tuaj yeem hloov pauv nws lub cev, tshuaj lom neeg, thiab roj ntsha, feem ntau nce nws lipophilicity. AI generated txhais raws li: Tetrahedron, 2000.
Dab tsi yog trimethylsilane siv rau?
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Trimethylsilane (Si (CH3) 3H) yog ib qho tsis muaj zog organosilicon compound siv nyob rau hauv semiconductor ua thiab tshuaj synthesis. Nws ua haujlwm ua ntej rau silicon- muaj cov yeeb yaj kiab thiab kev kho saum npoo, muab cov kev tswj xyuas kev ua haujlwm thiab cov yam ntxwv tso tawm.
Cov tshuaj twg muaj pawg trifluoromethyl?
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Qee cov tshuaj tseem ceeb uas muaj cov pab pawg trifluoromethyl suav nrog efavirenz (Sustiva), tus kab mob HIV thim rov qab transcriptase inhibitor; fluoxetine (Prozac), ib qho tshuaj tiv thaiv kev nyuaj siab; thiab celecoxib (Celebrex), cov tshuaj uas tsis yog tshuaj steroidal los tiv thaiv -inflammatory. Zoo ib yam li kws tshuaj, ntau cov tshuaj tua kab kuj muaj ib lossis ntau pawg trifluoromethyl.
Cim npe nrov: (trifluoromethyl) trimethylsilane CAS 81290-20-2, lwm tus neeg, manufacturers, hoobkas, lag luam wholesale, yuav, nqe, tej, kev muag khoom








